Which Technology Center handles design patent applications?

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Source: FAQ (MPEP-Based) BlueIron Update: 2024-09-27 10 Rules 5 Related FAQs This page is an FAQ based on guidance from the Manual of Patent Examining Procedure. It is provided as guidance, with links to the ground truth sources. This is information only: it is not legal advice. Design patent applications are handled by Technology Center (TC) 2900 at the United States Patent and Trademark Office (USPTO). As stated in MPEP 909.02(a) : “New nonprovisional design and plant applications are assigned to Technology Centers (TCs) 2900 and 1600, respectively, in the first instance by the Office of Patent Application Processing (OPAP).” This assignment to TC 2900 ensures that design patent applications are examined by examiners with specific expertise in design patents and the unique requirements for these types of applications. Related Rules from the Manual of Patent Examining Procedure 10 rules Collapse Provisional Applications Not Classified or Assigned MPEP 909.01(b) Application Must Be Fully Classified on Receipt MPEP 909.01(b) Required Classifications Required for Examiner Assignment MPEP 909.01(b) Permitted Patent Applications with National Security Concerns Must Not Be Published MPEP 101 Required National Security Classified Patent Application Must Be Declassified Before Publication and Allowance MPEP 120 Types of Secrecy Orders for Patent Applications MPEP 120 Type II Secrecy Order for Patent Applications with Classified Data MPEP 120 Disclosure Allowed for Classifiable Patent Applications MPEP 120 Type I Secrecy Order for Patent Applications MPEP 120 Requirements for Petitioning Rescission or Modification of Secrecy Order MPEP 120 Other Related FAQs 5 FAQs Collapse How are new design and plant patent applications initially assigned? How are new design and plant patent applications initially processed? What is the role of the Office of Patent Application Processing (OPAP) in handling new design and plant patent applications? What is the Technology Center responsible...