How can I access patent application information that is not available through Public PAIR?

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Source: FAQ (MPEP-Based) BlueIron Update: 2024-09-09 10 Rules 5 Related FAQs This page is an FAQ based on guidance from the Manual of Patent Examining Procedure. It is provided as guidance, with links to the ground truth sources. This is information only: it is not legal advice. For patent application information not available through Public PAIR, you can submit a request to the USPTO under the Freedom of Information Act (FOIA). Here’s how to proceed: Submit a written request to the USPTO’s FOIA Officer. Clearly identify the records you’re seeking. Explain why you believe the information should be disclosed if it’s not typically available to the public. Be prepared to pay any applicable fees for search and duplication. Wait for the USPTO to process your request and respond, which may take several weeks. Note that certain information may still be withheld if it falls under FOIA exemptions or is protected by other statutes. Related Rules from the Manual of Patent Examining Procedure 10 rules Collapse Freedom of Information Act Request Must Be Marked MPEP 103 Recommended Published Abandoned Application File Available to Public MPEP 103 Permitted Patent Application Available Through Patent Center If Maintained in IFW System MPEP 103 Published Abandoned Patent Application Files Available to Public MPEP 103 Required Patent Application Information Must Be Kept Confidential Until Published MPEP 103 Permitted FOIA Request for Non-Public USPTO Records Must Be In Writing MPEP 103 Required Public Access to Patented Application Files MPEP 103 Required Access to Abandoned Published Application Files Is Allowed MPEP 103 Required Abandoned Provisional Available Through Patent Center MPEP 103 Permitted Pending Application File Contents Available Upon Request MPEP 103 Other Related FAQs 5 FAQs Collapse What is a &#8216;file wrapper&#8217;? What information is available about reexamination proceedings? How can I petition for access to a confidential patent application? What patent app...