How can the public access reissue application files?

The public can access reissue application files through the USPTO’s Patent Center. MPEP 1430 states: “IFW reissue application files are open to inspection by the general public by way of Patent Center via the USPTO Internet site. In viewing the images of the files, members of the public will be able to view the entire content of the reissue application file history.” To access Patent Center, follow these steps:

1. Go to the USPTO website at www.uspto.gov
2. Navigate to the Patent Center
3. Search for the reissue application using the appropriate identifiers

This system allows for transparent and easy access to reissue application files, enabling the public to review the complete file history.

To learn more:

• reissue applications
• public access
• Patent Center
• USPTO